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Imagesetting RLD II Film
Product Features
 Introducing second generation of HN/RLD film
- Significantly improved antistatic base
- Improved linearity
- Flat after processing
- Clear base (no stain)
- Low DMin
- Low UV DMin
- Stable latent image
- Dual spectral sensitivity (630nm670nm)
- Sharper, harder dot than 3M HN film
- High DMax
- Fast exposure speed
- Good processing latitude in a variety of chemistries
- Excellent antihalation/emulsion differentiation after processing
Evolution of RLD II Film
| | HN | RLD | RLD II | | Characteristic | | Wavelength | 633nm | 633nm - 670nm | 633nm - 670nm | | | (helium neon) | (helium neon/red | (helium neon red | | | | laser diode) | laser diode) | | DMax | >= 4.95 | >= 5.05 | >= 5.2 | | DMin | .042 (±.01 ) | .042 (±.01 ) | .041 (±.01 ) | | UV DMin | 0.08(±.01) | 0.10/0.11 (±.01) | 0.08(±.01) | | Stain (Color) | Blue | Slight stain | No stain | | Film Clarity (Haze) | Acceptable | Acceptable | Significantly improved | | Midtone Shift | 8% - 10% | 6%-8% | 1% -5% | | Image Quality | Acceptable | Better | Best | | Resolution Pixel | 2.0 pixels | <2.0 pixels | 1.5 pixels | | Consistency | Acceptable | Improved | Greatly improved | | | (New emulsion- | (New emulsion | | | making process) | technology) | | Latent Image | Considerable | Slight | None | | Progression | | Starrynite | Acceptable | Acceptable | Acceptable | | Pinholes | Acceptable | Acceptable | Acceptable | | Antistat Effectiveness | Some | Some | Significantly Improved | | Antihalation/ | Difficult | Difficult | Easy | | Emulsion Differentiation | | (After Processing) |
Compatible Imagesetters
These imagesetters are compatible with RLD II film
AGFA: Avantra 20, 25, 30, 36, 44; AccuSet 800, 1000, 1200, 1400, 1500; Selectset 5000, 7000, 9600, 9700
Autologic: APS 6/70, 80,108
Barco: BG 3600, 3700, 3800; Megasetter
Birmy Graphics: 300TXF, 450HN
DuPont: Highlight
ECRM: ID 36; Pelbox 1030, 1045, 1230, 1245, 1530, 1545, 2530, 3030, 3850; VRL 36, 45
Escher Grad: EG 8000, 9000
Hyphen: 2400, 3100, 3200
III: Bitsetter II, III, IV; 3850
Linotype-Hell: L100, 300/330, 500/530/560, 630; Herkules
Monotype: Expressmaster 1000, 1016; Imagemaster 1000, 1524/3000, 5000, 7000
Pre-Press Solutions: 5300, 5500, 5630, Panther Pr.
Scitex: Dolev 200/250, 400/450, 800, 4Press
Screen: SF-123, 222, 323; 608, 688, 737, FTR 3035, 3050
Chemistries
These chemistries are compatible with RLD II film
- 3M RLD rapid laser developer (Primary recommendation)
- 3M RPD rapid processor developer
- Excelerate™ developer
- Kodak Rapid Access 2000
- Polychrome Rapid Access
- Polychrome Millenium™ 4000 Hard Dot
- DuPont CUFD
- Agfa G-101-C
- Fuji ChemPact™ Scanner Developer
- Fuji Hunt (Liquid)
All competitive chemistries listed here have been observed during field testing and appear to be
compatible; however,Imation makes no representations with respect to the capability of these products for use with RLD II film.
Processing Tips
The following processing conditions are recommended for RLD II film.
RLD rapid laser developer 1:4 Mix (1 gallon of developer to 4 gallons of water)
RLF rapid laser fix 1:6 Mix (1 gallon of Part A to 6 gallons of water)
Developer Temperature 95 degrees F
Fix Temperature 0 degrees F - 5 degrees lower than developer temperature
Development Time 20 seconds for deep tank processors; longer times of up to 45 seconds may be required for smaller tanks.
Copyright 1996 Imation. All rights reserved.
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